Ernest Y. (Ernest Y) Wu  Ernest Y. (Ernest Y) Wu photo       

contact information

Reliability Physics and Characterization


Professional Associations

Professional Associations:  Fellow, IEEE


Enter your page content here.

Ernest Y. Wu received his M.S. and Ph.D. degrees in physics from university of Kansas, Lawrence, KS, 1986 and 1989, respectively. He has been responsible for technology qualification and development of dielectric reliability methodologies for many generations of CMOS technologies from 250nm to 7nm nodes including SiO2, high-k, and low-k dielectrics in FEOL/BEOL/MOL applications. He has authored and co-authored more than 150 papers and gave numerous invited talks in the international journals and conferences. He has served on dielectric reliability committees in both international reliability physics symposium (IRPS) and international electron device meeting (IEDM). Currently, he is a senior technical staff member in IBM research division and working on a range of challenging and interesting projects from  technology and product/circuit reliability issues to  memory devices for neuromorphic computing applications. His research interests include statistics, device physics and simulation, dielectric reliability physics and its applications to assessment of product/circuit failures


You can generally copy and paste if you have content elsewhere. If you have a LinkedIn profile you can import it by clicking the "Import LinkedIn Profile" button below. Otherwise type in what you would like to say on this page.

If necessary, click on Tools and then Source Code to enter or edit raw HTML.