Atomic Layer Etching       

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Robert L. Bruce photo photoERIC A. JOSEPH photo Nathan Marchack photo Hiroyuki  (Hiro) Miyazoe photo photo Hongwen  (Wendy) Yan photo

Atomic Layer Etching Publications



2017

Characterizing fluorocarbon assisted atomic layer etching of Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
Metzler, Dominik and Li, Chen and Engelmann, Sebastian and Bruce, Robert L and Joseph, Eric A and Oehrlein, Gottlieb S
The Journal of Chemical Physics 146(5), 052801, AIP Publishing, 2017


2016

Applications for Surface Engineering Using Atomic Layer Etching-Invited Paper
John Papalia, Nathan Marchack, Robert Bruce, Hiroyuki Miyazoe, Sebastian Engelmann, Eric A Joseph
Solid State Phenomena, pp. 41--48, 2016

Fluorocarbon based atomic layer etching of Si3N4 and etching selectivity of SiO2 over Si3N4
Li, Chen and Metzler, Dominik and Lai, Chiukin Steven and Hudson, Eric A and Oehrlein, Gottlieb S
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34(4), 041307, AVS, 2016

Evaluation of ALE processes for patterning
Papalia, JM and Marchack, N and Bruce, RL and Miyazoe, H and Engelmann, SU and Joseph, EA
SPIE Advanced Lithography, pp. 97820H--97820H, 2016

Evaluation of ALE processes for patterning
J. M. Papalia ; N. Marchack ; R. L. Bruce ; H. Miyazoe ; S. U. Engelmann ; E. A. Joseph
Advanced Etch Technology for Nanopatterning V, 2016

Initial evaluation and comparison of plasma damage to atomic layer carbon materials using conventional and low Te plasma sources
Ashish V Jagtiani, Hiroyuki Miyazoe, Josephine Chang, Damon B Farmer, Michael Engel, Deborah Neumayer, Shu-Jen Han, Sebastian U Engelmann, David R Boris, Sandra C Hernandez and others
Journal of Vacuum Science & Technology A 34(1), 01B103, AVS: Science & Technology of Materials, Interfaces, and Processing, 2016

Application of cyclic fluorocarbon/argon discharges to device patterning
Dominik Metzler, Kishore Uppireddi, Robert L Bruce, Hiroyuki Miyazoe, Yu Zhu, William Price, Ed S Sikorski, Chen Li, Sebastian U Engelmann, Eric A Joseph and others
Journal of Vacuum Science & Technology A 34(1), 01B102, AVS: Science & Technology of Materials, Interfaces, and Processing, 2016

Fluorocarbon assisted atomic layer etching of SiO2 and Si using cyclic Ar/C4F8 and Ar/CHF3 plasma
Dominik Metzler, Chen Li, Sebastian Engelmann, Robert L Bruce, Eric A Joseph, Gottlieb S Oehrlein,
Journal of Vacuum Science & Technology A 34(1), 01B101, AVS: Science & Technology of Materials, Interfaces, and Processing, 2016


2015

Challenges of Tailoring Surface Chemistry and Plasma/Surface Interactions to Advance Atomic Layer Etching
S. U. Engelmann, R. L. Bruce, M. Nakamura, D. Metzler, S. G. Walton, E. A. Joseph
Ecs Journal of Solid State Science and Technology 4(6), N5054-N5060, 2015


2014

Fluorocarbon assisted atomic layer etching of SiO2 using cyclic Ar/C4F8 plasma
Dominik Metzler, Robert L. Bruce, Sebastian Engelmann, Eric A. Joseph, Gottlieb S. Oehrlein
Journal of Vacuum Science & Technology a 32(2), 2014


2011

Perspectives in nanoscale plasma etching: what are the ultimate limits?
Nathan Marchack, Jane P Chang
Journal of Physics D: Applied Physics 44(17), 174011, 2011
Abstract