Daniel Corliss  Daniel Corliss photo       

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STSM/Senior Manager Patterning Research, Member of IBM Academy of Technology
IBM Research - Albany
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2017

DSA patterning options for logics and memory applications
Liu, Chi-Chun and Franke, Elliott and Mignot, Yann and LeFevre, Scott and Sieg, Stuart and Chi, Cheng and Meli, Luciana and Parnell, Doni and Schmidt, Kristin and Sanchez, Martha and others
SPIE Advanced Lithography, pp. 1014603--1014603, 2017
Abstract

Printability and actinic AIMS review of programmed mask blank defects
Verduijn, Erik and Mangat, Pawitter and Wood, Obert and Rankin, Jed and Chen, Yulu and Goodwin, Francis and Capelli, Renzo and Perlitz, Sascha and Hellweg, Dirk and Bonam, Ravi and others
SPIE Advanced Lithography, pp. 101430K--101430K, 2017
Abstract

Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
Chi, Cheng and Liu, Chi-Chun and Meli, Luciana and Guo, Jing and Parnell, Doni and Mignot, Yann and Schmidt, Kristin and Sanchez, Martha and Farrell, Richard and Singh, Lovejeet and others
SPIE Advanced Lithography, pp. 101460Q--101460Q, 2017
Abstract


2016

Through-pellicle defect inspection of EUV masks using an ArF-based inspection tool
Goldfarb, Dario L and Broadbent, William and Wylie, Mark and Felix, Nelson and Corliss, Daniel
SPIE Advanced Lithography, pp. 97761H--97761H, 2016
Abstract

EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection
Bonam, Ravi K and Tien, Hungyu and Chou, Acer and Meli, Luciana and Halle, Scott D and Wu, Ivy and Huang, Xiaoxia and Lei, Chris and Kuan, Chiyan and Wang, Fei and others
SPIE Advanced Lithography, pp. 97761C--97761C, 2016
Abstract


2015

Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
Halle, Scott D and Meli, Luciana and Delancey, Robert and Vemareddy, Kaushik and Crispo, Gary and Bonam, Ravi and Burkhardt, Martin and Corliss, Daniel
SPIE Advanced Lithography, pp. 94221D--94221D, 2015
Abstract

EUV mask cleans comparison of frontside and dual-sided concurrent cleaning
Cheong, Lin Lee and Kindt, Louis and Turley, Christina and Leonhard, Dusty and Boyle, John and Robinson, Chris and Rankin, Jed and Corliss, Daniel
SPIE Advanced Lithography, pp. 94221M--94221M, 2015
Abstract

Towards production ready processing with a state-of-the-art EUV cluster
Petrillo, Karen and Saulnier, Nicole and Johnson, Richard and Meli, Luciana and Robinson, Chris and Koay, Chiew-seng and Felix, Nelson and Corliss, Daniel and Colburn, Matthew and Saito, Takashi and others
SPIE Advanced Lithography, pp. 94220R--94220R, 2015
Abstract


2014

E-beam inspection of EUV mask defects: To etch or not to etch?
Bonam, Ravi and Tien, Hung-Yu and Park, Chanro and Halle, Scott and Wang, Fei and Corliss, Daniel and Fang, Wei and Jau, Jack
SPIE Advanced Lithography, pp. 904812--904812, 2014
Abstract


2013

E-beam inspection of EUV programmed defect wafers for printability analysis
Bonam, Ravi and Halle, Scott and Corliss, Daniel and Tien, Hung-Yu and Wang, Fei and Fang, Wei and Jau, Jack
Advanced Semiconductor Manufacturing Conference (ASMC), 2013 24th Annual SEMI, pp. 310--314
Abstract

Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
McIntyre, Greg and Teeuwen, Leon and Sohmen, Erik and Wood, Obert and Corliss, Daniel and van den Akker, Theo and Bouten, Sander and van Setten, Eelco and Voznyi, Oleg and Han, Sang-In and others
Proc. SPIE, pp. 86792N, 2013
Abstract

E-beam Defect Inspection of EUV Masks and Wafers
Halle, Scott and Wang, Fei and Bonam, Ravi and Tien, Hung-Yu and Badger, Karen and Gallagher, Emily E and Qi, John and Corliss, Daniel and Tomlinson, Derek and Kuan, Chiyan and others
SEMICON Taiwan, 2013


2012

Insertion strategy for EUV lithography
Wood, Obert and Arnold, John and Brunner, Timothy and Burkhardt, Martin and Chen, James H-C and Civay, Deniz and Fan, Susan S-C and Gallagher, Emily and Halle, Scott and He, Ming and others
SPIE Advanced Lithography, pp. 832203--832203, 2012
Abstract


2011

Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
McIntyre, Gregory and Corliss, Daniel and Groenendijk, Remco and Carpaij, Rene and Van Niftrik, Ton and Landie, Guillaume and Tamura, Takao and Pepin, Thomas and Waddell, James and Woods, Jerry and others
SPIE Advanced Lithography, pp. 797306--797306, 2011
Abstract


2010

Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems
Mulder, Melchior and Engelen, Andr{\'e} and Noordman, Oscar and Streutker, Gert and van Drieenhuizen, Bert and van Nuenen, Cas and Endendijk, Wilfred and Verbeeck, Jef and Bouman, Wim and Bouma, Anita and others
SPIE Advanced Lithography, pp. 76401P--76401P, 2010
Abstract

Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
Melville, David and Rosenbluth, Alan E and Tian, Kehan and Lai, Kafai and Bagheri, Saeed and Tirapu-Azpiroz, Jaione and Meiring, Jason and Halle, Scott and McIntyre, Greg and Faure, Tom and others
SPIE Advanced Lithography, pp. 764006--764006, 2010
Abstract


2009

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
Lai, Kafai and Rosenbluth, Alan E and Bagheri, Saeed and Hoffnagle, John and Tian, Kehan and Melville, David and Tirapu-Azpiroz, Jaione and Fakhry, Moutaz and Kim, Young and Halle, Scott and others
SPIE Advanced Lithography, pp. 72740A--72740A, 2009
Abstract


2006

Laser bandwidth and other sources of focus blur in lithography
Brunner, Timothy and Corliss, Daniel and Butt, Shahid and Wiltshire, Timothy and Ausschnitt, Christopher P and Smith, Mark
Journal of Micro/Nanolithography, MEMS, and MOEMS 5(4), 043003--043003, International Society for Optics and Photonics, 2006
Abstract


2004

New paradigm in lens metrology for lithographic scanner: evaluation and exploration
Lai, Kafai and Gallatin, Gregg M and van de Kerkhof, Mark A and de Boeij, Wim and Kok, Haico and Schriever, Martin and Morillo, Jaime D and Fair, Robert H and Bennett, Stephanie and Corliss, Daniel A
Microlithography 2004, pp. 160--171
Abstract