Nicole A Saulnier  Nicole A Saulnier photo       

contact information

Manager, Semiconductor Materials and Process Technology Research
Albany, NY
  +1dash518dash292dash7444

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2017

Comprehensive analysis of line-edge and line-width roughness for EUV lithography
Bonam, Ravi and Liu, Chi-Chun and Breton, Mary and Sieg, Stuart and Seshadri, Indira and Saulnier, Nicole and Shearer, Jeffrey and Muthinti, Raja and Patlolla, Raghuveer and Huang, Huai
SPIE Advanced Lithography, pp. 101431A--101431A, 2017
Abstract

An OCD perspective of line edge and line width roughness metrology
Bonam, Ravi and Muthinti, Raja and Breton, Mary and Liu, Chi-Chun and Sieg, Stuart and Seshadri, Indira and Saulnier, Nicole and Shearer, Jeffrey and Patlolla, Raghuveer and Huang, Huai
SPIE Advanced Lithography, pp. 1014511--1014511, 2017
Abstract

Design intent optimization at the beyond 7nm node: the intersection of DTCO and EUVL stochastic mitigation techniques
Crouse, Michael and Liebmann, Lars and Plachecki, Vince and Salama, Mohamed and Chen, Yulu and Saulnier, Nicole and Dunn, Derren and Matthew, Itty and Hsu, Stephen and Gronlund, Keith and others
SPIE Advanced Lithography, pp. 101480H--101480H, 2017
Abstract

Single-expose patterning development for EUV lithography
De Silva, Anuja and Petrillo, Karen E and Meli, Luciana and Shearer, Jefferey C and Beique, Genevieve and Sun, Lei and Seshadri, Indira and Oh, Taehwan and Ayothi, Ramakrishnan and Saulnier, Nicole and others
SPIE Advanced Lithography, pp. 101431G--101431G, 2017
Abstract


2016

EUV implementation of assist features in contact patterns
Jiang, Fan and Raghunathan, Ananthan and Burkhardt, Martin and Saulnier, Nicole and Tritchkov, Alexander and Jayaram, Srividya and Word, James
SPIE Advanced Lithography, pp. 97761U--97761U, 2016
Abstract

Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process
Hitomi, Keiichiro and Halle, Scott and Miller, Marshal and Graur, Ioana and Saulnier, Nicole and Dunn, Derren and Okai, Nobuhiro and Hotta, Shoji and Yamaguchi, Atuko and Komuro, Hitoshi and others
Journal of Micro/Nanolithography, MEMS, and MOEMS 15(3), 034002--034002, International Society for Optics and Photonics, 2016
Abstract

Comparison of left and right side line-edge roughness in lithography
Sun, Lei and Saulnier, Nicole and Beique, Genevieve and Verduijn, Erik and Wang, Wenhui and Xu, Yongan and Tang, Hao and Chen, Yulu and Kim, Ryoung-han and Arnold, John and others
SPIE Advanced Lithography, pp. 977822--977822, 2016
Abstract

EUV Lithography: Co-optimization of Process and Computation Lithography Solutions (Invited Talk)
Nicole Saulnier
60th International Conference on Electron, Ion, and Photo Beam Technology and Nanofabrication: Optical and EUV Lithography, 2016
Abstract

Improvement of optical proximity-effect correction model accuracy by hybrid optical proximity-effect correction modeling and shrink correction technique for 10-nm node process
Hitomi, Keiichiro and Halle, Scott and Miller, Marshal and Graur, Ioana and Saulnier, Nicole and Dunn, Derren and Okai, Nobuhiro and Hotta, Shoji and Yamaguchi, Atuko and Komuro, Hitoshi and others
Journal of Micro/Nanolithography, MEMS, and MOEMS 15(3), 034002--034002, International Society for Optics and Photonics, 2016
Abstract

EUV patterning successes and frontiers
Felix, Nelson and Corliss, Dan and Petrillo, Karen and Saulnier, Nicole and Xu, Yongan and Meli, Luciana and Tang, Hao and De Silva, Anuja and Hamieh, Bassem and Burkhardt, Martin and others
SPIE Advanced Lithography, pp. 97761O--97761O, 2016
Abstract


2015

Reduction of Critical Dimension Difference in Litho-Etch-Litho-Etch Double Patterning Process
Tang, Hao and Shearer, Jeffrey C and Cheong, Lin Lee and Saulnier, Nicole A and Sieg, Stuart A and Petrillo, Karen and Metz, Andrew and Arnold, John C
Journal of Photopolymer Science and Technology 28(1), 13--16, The Society of Photopolymer Science and Technology (SPST), 2015
Abstract

Towards production ready processing with a state-of-the-art EUV cluster
Petrillo, Karen and Saulnier, Nicole and Johnson, Richard and Meli, Luciana and Robinson, Chris and Koay, Chiew-seng and Felix, Nelson and Corliss, Daniel and Colburn, Matthew and Saito, Takashi and others
SPIE Advanced Lithography, pp. 94220R--94220R, 2015
Abstract

EUV processing and characterization for BEOL
Saulnier, Nicole and Xu, Yongan and Wang, Wenhui and Sun, Lei and Cheong, Lin Lee and Lallement, Romain and Beique, Genevieve and Hamieh, Bassem and Arnold, John C and Felix, Nelson and others
SPIE Advanced Lithography, pp. 94220T--94220T, 2015
Abstract


2014

Hybrid OPC modeling with SEM contour technique for 10nm node process
Hitomi, Keiichiro and Halle, Scott and Miller, Marshal and Graur, Ioana and Saulnier, Nicole and Dunn, Derren and Okai, Nobuhiro and Hotta, Shoji and Yamaguchi, Atsuko and Komuro, Hitoshi and others
SPIE Advanced Lithography, pp. 90520W--90520W, 2014
Abstract


2013

Feasibility study of resist slimming for SIT
Saulnier, Nicole and Koay, Chiew-seng and Colburn, Matthew and Hetzer, David and Cicoria, Michael and Ludwicki, Jonathan
SPIE Advanced Lithography, pp. 86820E--86820E, 2013
Abstract

48nm Pitch cu dual-damascene interconnects using self aligned double patterning scheme
Chen, Shyng-Tsong and Kim, Tae-Soo and Nam, Seo-woo and Lafferty, Neal and Koay, Chiew-Seng and Saulnier, Nicole and Wang, Wenhui and Xu, Yongan and Duclaux, Benjamin and Mignot, Yann and others
Interconnect Technology Conference (IITC), 2013 IEEE International, pp. 1--3
Abstract


2012

56 nm pitch copper dual-damascene interconnects with triple pitch split metal and double pitch split via
Chen, James Hsueh-Chung and Waskiewicz, Christopher and Fan, Susan Su-Chen and Halle, Scott and Koay, Chiew-seng and Xu, Yongan and Saulnier, Nicole and Tseng, Chia-Hsun and Yin, Yunpeng and Mignot, Yann and others
Interconnect Technology Conference (IITC), 2012 IEEE International, pp. 1--3
Abstract


2011

Computational Modeling of Photonic Crystal Microcavity Single-Photon Emitters
Saulnier, Nicole A
2011 - repository.cmu.edu
Abstract


Year Unknown

Micro/Nano Lithography Successes and frontiers in extreme UV patterning
Felix, Nelson and Colburn, Matthew and Petrillo, Karen and Saulnier, Nicole and Xu, Yongan and Meli, Luciana and De Silva, Anuja and Seshadri, Indira and Sieg, Stuart and Dunn, Derren
spie.org, 0
Abstract