Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In this study we consider adaptive mesh refinement for the solution of Maxwell's equations in the quasi-static or diffusion regime. We propose a new finite volume OcTree discretization for the problem and show how to construct second order stencils on Yee grids, extending the known first order discretization stencils. We then develop an effective preconditioner to the problem. We show that our preconditioner performs well for discontinuous conductivities as well as for a wide range of frequencies. © 2011 Society for Industrial and Applied Mathematics.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Igor Devetak, Andreas Winter
ISIT 2003
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI