E.-A. Knabbe, J.W. Coburn, et al.
Surface Science
A bakable ultrahigh vacuum system has been constructed to sample the particle flux incident on the substrate of a planar diode sputtering system. A beam of particles from the discharge is extracted into a long mean free path environment where it passes through a 90° deflection electrostatic analyzer into a quadrupole residual gas analyzer. The mass spectra of positive ions incident on a substrate during dc sputtering of copper and aluminum bronze are shown and the influence of hydrogen contamination is illustrated. The energy distribution of the Ar+ ions is presented for several values of the substrate bias. © 1970 The American Institute of Physics.
E.-A. Knabbe, J.W. Coburn, et al.
Surface Science
J.W. Coburn, Eric Kay
Applied Physics Letters
E.W. Eckstein, J.W. Coburn, et al.
International Journal of Mass Spectrometry and Ion Physics
J.W. Coburn, W.W. Harrison
Applied Spectroscopy Reviews