Role of ions in reactive ion etching
J.W. Coburn
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
A bakable ultrahigh vacuum system has been constructed to sample the particle flux incident on the substrate of a planar diode sputtering system. A beam of particles from the discharge is extracted into a long mean free path environment where it passes through a 90° deflection electrostatic analyzer into a quadrupole residual gas analyzer. The mass spectra of positive ions incident on a substrate during dc sputtering of copper and aluminum bronze are shown and the influence of hydrogen contamination is illustrated. The energy distribution of the Ar+ ions is presented for several values of the substrate bias. © 1970 The American Institute of Physics.
J.W. Coburn
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
J.W. Coburn
Journal of Applied Physics
T.J. Chuang, H.F. Winters, et al.
Applications of Surface Science
Harold F. Winters, J.W. Coburn
Applied Physics Letters