Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The buffer block methodology has become increasingly popular as more and more buffers are needed in deep-submicron design, and it leads to many challenging problems in physical design. In this article, we present a polynomial-time exact algorithm for integrated pin assignment and buffer planning for all two-pin nets from one macro block (source block) to all other blocks of a given buffer block plan, while minimizing the total cost α · W + β · R for any positive α and β where W is the total wirelength, and R is the number of buffers. By applying this algorithm iteratively (each time, pick one block as the source block), it provides a polynomial-time algorithm for pin assignment and buffer planning for nets among multiple macro blocks. Experimental results demonstrate its efficiency and effectiveness. © 2005 ACM.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Oliver Bodemer
IBM J. Res. Dev
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering