Griselda Bonilla, Nicholas A. Lanzillo, et al.
IEDM 2020
The applicability of the Fuchs-Sondheimer and Mayadas-Shatzkes scattering models below the 14nm node with wide interconnect trenches of variable aspect ratio is investigated. The aspect ratio of these lines was varied between 1.2, 1.8, and 2.5; and the grain structure was concurrently manipulated. As the vertical dimension varied from greater than and less than the mean free path in Cu (39nm) at 21°C, the experiment found that the current approximation to the Fuchs-Sondheimer equation requires adjustment to the leading coefficient. Further, parameter fitting leads to the conclusion that specularity in these samples has a negative value of -0.2. The negative specularity is explained by surface roughness. The Mayadas-Shatzkes model retains its applicability and fits the data with a reflectivity of 0.16-0.17.
Griselda Bonilla, Nicholas A. Lanzillo, et al.
IEDM 2020
Takeshi Nogami, H. Huang, et al.
VLSI Technology 2019
X. Sun, B. Peethala, et al.
ECS Meeting 2017
C. K. Hu, Lynne Gignac, et al.
IEDM 2018