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Swiss Phot. Ind. Symp. on Phot. Sens. 2024
Atomic beam diffraction has become a powerful tool for surface structural investigations. The requirements for an apparatus capable of atomic diffraction under UHV conditions are discussed and the theoretical framework necessary for quantitative analysis of diffraction data is outlined. Recent results obtained on ionic crystals, semiconductors, metals and adsorbate-covered surfaces are reviewed. © 1980.
Giulia Prone, Dominik Scherrer, et al.
Swiss Phot. Ind. Symp. on Phot. Sens. 2024
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