Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
The new complex yttrium benzoylpivaloylmethanide and its acetonitrile adduct have been characterized by IR, NMR, mass spectroscopy, X-ray structure analysis, and thermogravimetric/differential thermal analysis. In situ flux measurements and mass spectroscopic studies have been performed to test the suitability of this compound as a precursor for the deposition of complex oxide thin films under molecular beam conditions. Finally it has been used to deposit epitaxial Y2O3 (001) thin films on SrTiO3 (001) substrates.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
K.N. Tu
Materials Science and Engineering: A