O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
No abstract available.
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
Thomas E. Karis, C. Mark Seymour, et al.
Rheologica Acta
A. Krol, C.J. Sher, et al.
Surface Science
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010