L.J. Terminello, F.J. Himpsel, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
Comparison of the selective adsorption and reactivity behavior of WF 6 and TaF5 on SiO2 and polyimide surfaces
Abstract
The initial stages of WF6 and TaF5 adsorption on SiO2 and polyimide surfaces were investigated by photoelectron spectroscopy. WF6 selectively adsorbs on Si relative to SiO 2 and polyimide, while TaF5 exhibited nonselective adsorption behavior. This trend is explained by differences in molecular structure and suggests a general basis for predicting selective deposition.
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