Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
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SPIE Advanced Lithography 2007
No abstract available.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
George Markowsky
J. Math. Anal. Appl.
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
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SPIE Advanced Lithography 1998