Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A novel method to measure strain without mediation of stress has been developed to assess relative displacements in art objects responding to environmental fluctuations. The method uses a chip with a variable resistor composed of a Giant Magnetic Resistance (GMR) material. In a case study, the dimensional changes of wooden test vehicles subjected to sudden humidity changes at constant temperature inside a controlled environmental chamber were measured. Furthermore, an optimized sensor deployment and converging algorithm to increase the accuracy of the measurements was developed and applied. © 2013 Springer-Verlag Berlin Heidelberg.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
David B. Mitzi
Journal of Materials Chemistry
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009