PaperIrredundancy in circular arc graphsMartin Charles Golumbic, Renu C. LaskarDiscrete Applied Mathematics
Conference paperCharacterization of photoresist spatial resolution by interferometric lithographyJohn A. Hoffnagle, William D. Hinsberg, et al.Microlithography 2003
Conference paperTotal Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solutionMoutaz Fakhry, Yuri Granik, et al.SPIE Photomask Technology + EUV Lithography 2011