William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed. © 2007 American Chemical Society.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
A. Gangulee, F.M. D'Heurle
Thin Solid Films