A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed. © 2007 American Chemical Society.
A.B. McLean, R.H. Williams
Journal of Physics C: Solid State Physics
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
Shiyi Chen, Daniel Martínez, et al.
Physics of Fluids
Mark W. Dowley
Solid State Communications