Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Transport in Nb/AlOx/Nb junctions involves two parallel channels, barrier defects (pinholes) with sub-nanometer dimensions and nearly-ideal tunneling regions. We fit junction characteristics using only a single parameter, the ratio of the normal state conductances of these current paths. Our barrier model accounts for the excellent Josephson behavior and highly non-ideal quasiparticle characteristics of junctions with critical current densities as high as 4 mA/µm2. It appears to be quite generally applicable to tunnel junctions. © 1995 IEEE
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME