William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
We have studied the fractional quantization of the Hall resistance at 0.51 K in two-dimensional hole systems formed at p+ interfaces with mobilities as high as 8.0 × 104 cm2/Vs at 4 K. In addition to the Hall quantization for a fractional filling factor =23, we report for the first time the observation of an almost fully developed Hall plateau at =35 and the existence of weak but distinct structure in the magnetoresistance for =37 and 65. Similarly, magnetoresistance minima occurred at =53, 43, 23, 35, and 25. In contrast with two-dimensional electron systems, conspicuously absent was any magnetoresistance feature in the vicinity of =45. © 1984 The American Physical Society.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
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Microelectronic Engineering
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Journal of Applied Mechanics, Transactions ASME
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