Issues in NiSi-gated FDSOI device integration
Jakub Kedzierski, Diane Boyd, et al.
IEDM 2003
We combine nanometer-scale polymer self assembly with advanced semiconductor microfabrication to produce metaloxide-semiconductor (MOS) capacitors with accumulation capacitance more than 400% higher than planar devices of the same lateral area. The self assembly technique achieves this degree of enhancement using only standard processing techniques, thereby obviating additional process complexity. These devices are suitable for use as on-chip power supply decoupling capacitors, particularly in high-performance silicon-on-insulator technology. © 2004 IEEE.
Jakub Kedzierski, Diane Boyd, et al.
IEDM 2003
Ting Xu, Jodi Stevens, et al.
Advanced Functional Materials
Joan K. Bosworth, Marvin Y. Paik, et al.
ACS Nano
Niyaz Khusnatdinov, Gerard M. Schmid, et al.
Microelectronic Engineering