Robert W. Keyes, Erik P. Harris, et al.
Proceedings of the IEEE
Suitably strained silicon exhibits a mobility anisotropy that can be used to advantage in field-effect transistors. The desired strain can be achieved through heteroepitaxy. Copyright © 1986 by The Institute of Electrical and Electronics Engineers, Inc.
Robert W. Keyes, Erik P. Harris, et al.
Proceedings of the IEEE
Robert W. Keyes
Proceedings of the IEEE
Robert W. Keyes
IEEE TC
Robert W. Keyes
Physical Review Letters