Conference paper
Technology trends in sub-0.5 μm bipolar
T.H. Ning
SSDM 1990
A brief historical account of the development of advanced silicon bipolar transistors (SBTs) at IBM Research is described, with a focus on discussing the technical merits of the directions taken. A perspective on the future of silicon bipolar is given, including a discussion on the merits of SiGe-base transistors, and on the scaling limits of both Si-base and SiGe-base transistors. An apples-to-apples comparison of SiGe-base transistors and GaAs HBTs is made, showing that GaAs HBTs are inherently faster and more scaleable than SiGe-base transistors.
T.H. Ning
SSDM 1990
D.D. Tang, G.P. Li, et al.
IEDM 1985
J. Warnock, P.F. Lu, et al.
IEDM 1989
T.H. Ning
IEEE T-ED