Paper

Induced orientational order in symmetric diblock copolymer thin films

Abstract

A new polymer multilayer fabrication method by the use of thin films of lamellar polystyrene-block-poly(methyl methacrylate was investigated. The thin-film striped patterns of parallel and perpendicular polystyrene-block- poly(methyl methacrylate) (PS-b-PMMA) lamellar to compare the time evolution of ε were prepared. The thin films of cylindrical and lamellar materials were spin casted and annealed for a time range of 5-4000 minutes. The perpendicular orientation of the lamellar domains were surface pretreated with a random copolymer brush prior to diblock copolymer applications. The measurements show that the topological differences between the cylindrical and lamellar morphologies influence coarsening kinetics.

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T.N. Morgan

Semiconductor Science and Technology