K. Kehler, J.W. Coburn, et al.
JVSTA
A simple phenomenological theory of alloy sputtering is developed which suggests that in some instances the depth resolution of depth profiling measurements is limited by the time it takes to create a layer of altered chemical composition at the surface.
K. Kehler, J.W. Coburn, et al.
JVSTA
H.F. Winters, J.W. Coburn
Applied Physics Letters
J.W. Coburn
Plasma Chemistry and Plasma Processing
J.W. Coburn, Kenneth Lee
Journal of Applied Physics