Integration of self-assembled diblock copolymers for semiconductor capacitor fabrication

Silicon capacitors with increased charge storage capacity over planar structures were produced by combining self-organizing diblock copolymer system with semiconductor processing. Diblock copolymer thin films were used as a mask for dry etching to roughen a silicon surface. This was done on a 30 nm length scale, which was well below photolithographic resolution limits. Silicon etch depth was correlated with capacitance values using electron microscopy. This block copolymer nanotemplating process is scalable to large wafer dimensions and compatible to standard semiconductor processing techniques.