B.L. Crowder, G.D. Pettit
Physical Review
Paper
Ion Implantation Doping of Si with 70 to 300 keV B. P. and As
Abstract
No abstract available.
Related
Conference paper
Manufacturing technology and the role of manufacturing research
Albert J. Blodgett, B.L. Crowder
International Electronic Manufacturing Technology Symposium 1987
J.C. Tsang, M.W. Shafer, et al.
Physical Review B
M.Y. Tsai, H.H. Chao, et al.
JES