Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Paper
01 Jul 1987

Kinetics of high-temperature thermal decomposition of Si0 2 on Si(100)

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Abstract

No abstract available.

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Date

01 Jul 1987

Publication

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Authors

  • M. Liehr
  • J.E. Lewis
  • G.W. RubLoff
IBM-affiliated at time of publication

Topics

  • Physical Sciences
  • Materials Discovery

Resources

  • Publication

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