Laser chemical vapor deposition of copper

F.A. Houle; C.R. Jones; T.H. Baum; C. Pico; C.A. Kovac

doi:10.1063/1.95685

Applied Physics Letters

Paper

01 Jan 1985

Laser chemical vapor deposition of copper

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Abstract

The first laser-induced deposition of copper has been demonstrated using a volatile copper coordination complex. The technique is characterized by reasonable rates and by the high quality of copper produced.

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Factors controlling pattern formation in chemically amplified resists at sub-100 nm dimensions

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Visible laser-induced nucleation and growth of Cr, Mo, and W films from the hexacarbonyls. Reactivity of CO on film surfaces

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Simulations of thermal decomposition and film growth from the group VI metal hexacarbonyls

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Abstract

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