E. Spiller, D.E. Eastman, et al.
Journal of Applied Physics
In this review of recent progress in lithography and microscopy by X-rays the authors show how X-ray lithography is used to replicate microcircuit patterns with dimensions below 1 mu m, and how these advances have improved the older technique of X-ray microradiography.
E. Spiller, D.E. Eastman, et al.
Journal of Applied Physics
E. Spiller, Alan E. Rosenbluth
Opt. Eng.
E. Ziegler, Y. Lepetre, et al.
Applied Physics Letters
D. Sayre, J. Kirz, et al.
Ultramicroscopy