Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
As CMOS technology scales to deep-submicron dimensions, designers face new challenges in determining the proper balance between aggressive high-performance transistors and lower-performance transistors to optimize system power and performance for a given application. Determining this balance is crucial for battery-powered handheld devices in which transistor leakage and active power limit the available system performance. This paper explores these questions and describes circuit techniques for low-power communication systems which exploit the capabilities of advanced CMOS technology.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Maciel Zortea, Miguel Paredes, et al.
IGARSS 2021
Raymond F. Boyce, Donald D. Chamberlin, et al.
CACM
Erich P. Stuntebeck, John S. Davis II, et al.
HotMobile 2008