Conference paper
Silicon-on-sapphire for RF Si systems 2000
I. Lagnado, P.R. De La Houssaye, et al.
SiRF 2000
A new method for measuring the output (ID-VD) characteristics of SOI MOSFET's without self-heating is described. The method uses short pulses with a low repetition rate, and a reverse transient loadline construction. The technique is demonstrated by measuring 0.25 µm bulk and SOI MOSFET's with 5-nm gate oxide. Application of the method to the extraction of device temperature as a function of dc power is also illustrated. © 1995 IEEE
I. Lagnado, P.R. De La Houssaye, et al.
SiRF 2000
J.H. Comfort, E.F. Crabbe, et al.
IEDM 1991
D.L. Harame, J.H. Comfort, et al.
IEEE Transactions on Electron Devices
Keith A. Jenkins, Y. Taur, et al.
IEEE International SOI Conference 1996