W.D. Hinsberg, F.A. Houle, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Mechanistic studies of chemically amplified photoresists
Related
W.D. Hinsberg, F.A. Houle, et al.
Journal of Physical Chemistry A
Hiroshi Ito, G.M. Wallraff, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
G.M. Wallraff, W.D. Hinsberg, et al.
J. Photopolym. Sci. Tech.