Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
For Markov chains of M/G/1 type that are not skip-free to the left, the corresponding G matrix is shown to have special structure and be determined by its first block row. An algorithm that takes advantage of this structure is developed for computing G. For non-skip-free M/G/1 type Markov chains, the algorithm significantly reduces the computational complexity of calculating the G matrix, when compared with reblocking to a system that is skip-free to the left and then applying usual iteration schemes to find G. A similar algorithm to calculate the R matrix for G/M/1 type Markov chains that are not skip-free to the right is also described.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Robert F. Gordon, Edward A. MacNair, et al.
WSC 1985
Harpreet S. Sawhney
IS&T/SPIE Electronic Imaging 1994