F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis
F. Odeh, I. Tadjbakhsh
Archive for Rational Mechanics and Analysis
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998