Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper considers the number of inner iterations required per outer iteration for the algorithm proposed by Conn et al. [9]. We show that asymptotically, under suitable reasonable assumptions, a single inner iteration suffices.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Imran Nasim, Melanie Weber
SCML 2024
Leo Liberti, James Ostrowski
Journal of Global Optimization
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum