PaperIon beam patterning of block copolymer thin filmsRanulfo Allen, John Baglin, et al.J. Photopolym. Sci. Tech.
PaperSilylation of resist materials using di- and polyfunctional organosilicon compoundsE. Babich, J. Paraszczak, et al.Microelectronic Engineering
Conference paperLearning Reduced Order Dynamics via Geometric RepresentationsImran Nasim, Melanie WeberSCML 2024