Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
We review recent progress made towards commercializable read-write, fast-access holographic data storage. This includes a recent demonstration of high areal density holographic storage [1], systems architectures for extending this high density to high capacity using phase-conjugate readout [2], and recent experimental progress along these lines. Other topics include using signal processing to relieve alignment and distortion constraints [3], optical elements for improving beam uniformity [4], and most importantly, requirements and prospects for improved photorefractive materials for two-color, gated nonvolatile holographic storage [5].
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Ziv Bar-Yossef, T.S. Jayram, et al.
Journal of Computer and System Sciences
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Sonia Cafieri, Jon Lee, et al.
Journal of Global Optimization