Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
Analogues of poly(methyl methacrylate) (PMMA) incorporating halogen atoms in the α-position or in the ester side group have recently attracted much attention as sensitive electron-beam positive resists. Ito et al. have reported that methyl α-(trifluoromethyl)acrylate(MTFMA) does not undergo radical homopolymerization but readily polymerizes bypyridine initiation due to the low electron density on the double bond. © 1984, American Chemical Society. All rights reserved.
Fernando Marianno, Wang Zhou, et al.
INFORMS 2021
J.H. Kaufman, Owen R. Melroy, et al.
Synthetic Metals
David B. Mitzi
Journal of Materials Chemistry
A. Reisman, M. Berkenblit, et al.
JES