Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Simulations to design photomasks are made consistent with the brightness theorem if the source map is rescaled by pixel-solid-angle. Standard Fresnel radiometry factors preserve consistency during propagation, and are derivable from rigorous vector diffraction integrals. © 2011 OSA.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Chi Chun Liu, Richard Farrell, et al.
MEMS/NEMS/MOEMS 2019
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011