Conference paper
Characterization of line width variation
Alfred K. Wong, Antoinette F. Molless, et al.
SPIE Advanced Lithography 2000
Paper
Randomness in arithmetic and the decline and fall of reductionism in pure mathematics
Related
Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Amir Ali Ahmadi, Raphaël M. Jungers, et al.
SICON
Y.Y. Li, K.S. Leung, et al.
J Combin Optim