Chemically amplified resists: Past, present, and future
Hiroshi Ito
SPIE Advances in Resist Technology and Processing 1999
The authors investigated preferred pathways in the 1:1 reaction of TFMST (alpha-trifluoromethylstyrene) with several anionic initiators. The reactions were in general much cleaner than that of MTFMA (Methyl alpha(trifluoromethyl)acryl) with nBuLi which involves participation of the ester functionality. The major common products were gem-difluoroolefins and trisubstituted fluoroethylenes. The identification of the products was achieved by comparison of GC retention times, IR, 1H, 13C, and 19F NMR spectra, elemental analysis, and GC/MS of products (isolated in many cases) with those of synthesized samples.
Hiroshi Ito
SPIE Advances in Resist Technology and Processing 1999
Hiroshi Ito, Arno Knebelkamp, et al.
ACS PMSE 1992
R.D. Miller, A.F. Renaldo, et al.
Journal of Organic Chemistry
Hiroshi Ito, G.M. Wallraff, et al.
International Conference on Microprocesses and Nanotechnology 2001