Higher-K formation in atomic layer deposited Hf1-xAlxOy
Kandabara Tapily, Steven Consiglio, et al.
ECSSMEQ 2014
We demonstrate a novel process for building a Resistive RAM (ReRAM) stack which reduces the forming voltage ( ) and increases the switching resistance, both characteristics that are important ingredients for the use of ReRAM in scalable analog compute for AI. Utilizing this process, we explore analog switching characteristics above 100k and demonstrate 4-bit programming at Rmax . Utilizing the same writing characteristics, CIFAR-10 inference simulation shows 90% accuracy, comparable to the full precision model accuracy.
Kandabara Tapily, Steven Consiglio, et al.
ECSSMEQ 2014
Kangguo Cheng, A. Khakifirooz, et al.
VLSI Circuits 2011
Youngseok Kim, Luke C. G. Govia, et al.
Nature Communications
H. Jagannathan, Robert D. Clark, et al.
ECS Transactions