Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Paper
Sensitive resist systems based on acid‐catalyzed polymer reactions
Abstract
Acid‐catalyzed polymer reactions have been successfully utilized in the design of chemical amplification resist systems for semiconductor manufacturing. In this paper are described preparation and acid‐catalyzed depolymerization reactions of α‐substituted polystyrenes. Copyright © 1992 Hüthig & Wepf Verlag
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