Conference paper
Polysilanes: photochemistry and deep UV lithography
R.D. Miller, G.M. Wallraff, et al.
SPE Regional Technical Conference 1988
High molecular weight polysilane derivatives represent a new class of radiation sensitive polymers with very unusual electronic properties for which a number of potential applications have been discovered. This talk will touch briefly on polymer synthesis and characterization, mechanisms for the photo chemical decomposition and describe certain selected applications. Copyright © 1989 Wiley‐VCH Verlag GmbH & Co. KGaA, Weinheim
R.D. Miller, G.M. Wallraff, et al.
SPE Regional Technical Conference 1988
T. Rajagopalan, B. Lahlouh, et al.
Applied Physics Letters
R.D. Miller, D. Kaufmann
Journal of the Chemical Society, Chemical Communications
C.R. Moylan, R.D. Miller, et al.
LEOS 1995