Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
Conference paperTotal Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solutionMoutaz Fakhry, Yuri Granik, et al.SPIE Photomask Technology + EUV Lithography 2011
PaperDifferential operators and the theory of binomial enumerationGeorge MarkowskyJ. Math. Anal. Appl.
PaperJoint spectral radius and path-complete graph Lyapunov functionsAmir Ali Ahmadi, Raphaël M. Jungers, et al.SICON
