PaperPerformance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO2 gate dielectricsMin Yang, Evgeni P. Gusev, et al.IEEE Electron Device Letters
Invited talkCrystallization of hafnium-oxide-based ferroelectrics for BEOL integrationMartin M. Frank, Eduard A. Cartier, et al.EDTM 2022
PaperImpact of nanosecond laser annealing on vacancies in electroplated Cu films studied by monoenergetic positron beamsAkira Uedono, Takeshi Nogami, et al.Journal of Applied Physics
Conference paperFinFET performance with Si:P and Ge:Group-III-Metal metastable contact trench alloysOleg Gluschenkov, Zuoguang Liu, et al.IEDM 2016
