Conference paper
Top-surface-imaging resist for deep UV lithography
Scott A. MacDonald, H. Schlosser, et al.
International Technical Conference on Photopolymers 1991
Scott A. MacDonald, H. Schlosser, et al.
International Technical Conference on Photopolymers 1991
Ratnam Sooriyakumaran, Debra Fenzel-Alexander, et al.
Proceedings of SPIE - The International Society for Optical Engineering
P. Rao Varanasi, Ann Marie Mewherter, et al.
J. Photopolym. Sci. Tech.
R.D. Allen, G. Breyta, et al.
J. Photopolym. Sci. Tech.