ReviewNucleation of a new phase from the interaction of two adjacent phases: Some silicidesF.M. d'HeurleJournal of Materials Research
PaperTantalum silicide films deposited by dc sputteringJ. Angilello, J.E.E. Baglin, et al.Journal of Electronic Materials
PaperMagnetic properties of amorphous neodymium-transition-metal filmsR.C. Taylor, T.R. McGuire, et al.Journal of Applied Physics
PaperFormation of thin films of CoSi2: Nucleation and diffusion mechanismsF.M. d'Heurle, C.S. PeterssonThin Solid Films
