Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
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This article has presented the key issues that can help designers of nonblocking systems make oft-needed compromises and balance trade-offs to reach a feasible design that satisfies all the requirements. In considering the totality of these issues, designers should go through a few passes on this list of features and issues. First, they should identify and separate the features that are absolutely necessary from those that are desirable but open to compromise. After that, they can start to consider the implications of using these various features. © 2013 ACM.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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INFOCOM 2008
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Qinghua Daxue Xuebao/Journal of Tsinghua University
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