P. Artal, M. Avalos-Borja, et al.
Ultramicroscopy
A specimen introduction/reaction system is described for a transmission electron microscope modified for UHV operation. The dry-pumped and UHV-compatible reaction chamber can be used for subjecting microscope specimens to RF-plasma treatments. The plasma oxidation and reduction of an in-situ-deposited particulate palladium film supported on amorphous alumina is described. A significant degree of redispersion is caused by this low-temperature process. © 1987.
P. Artal, M. Avalos-Borja, et al.
Ultramicroscopy
C.R. Henry, H. Poppa
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
T. Vanzandt, R. Browning, et al.
Journal of Electron Spectroscopy and Related Phenomena
G. Fuchs, D. Neiman, et al.
Thin Solid Films