Conference paper
Intensive optimization of masks and sources for 22nm lithography
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
We present an extension to the subgradient algorithm to produce primal as well as dual solutions. It can be seen as a fast way to carry out an approximation of Dantzig-Wolfe decomposition. This gives a fast method for producing approximations for large scale linear programs. It is based on a new theorem in linear programming duality. We present successful experience with linear programs coming from set partitioning, set covering, max-cut and plant location.
Alan E. Rosenbluth, David O. Melville, et al.
SPIE Advanced Lithography 2009
Parijat Dube, Joao P.M. Goncalves, et al.
WSC 2014
Francisco Barahona, László Ladányi
RAIRO - Operations Research
Francisco Barahona, David Jensen
Mathematical Programming, Series B